Description - High-K Gate Dielectrics by Michel Houssa
This book reviews the state-of-the-art in high permittivity gate dielectric research. Consisting of contributions from reseachers from Europe and the USA, the first chapter describes the various deposition techniques used for construction of layers at these dimensions. The second chapter considers characterisation techniques of the physical, chemical, structural and electronic properties of these materials. The third chapter reviews the theoretical work done in the field, and the final section is devoted to technological applications.
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